67-6461-53 Wafer with 12 inch Ti+Cu (Sputtered) Film (Ti50 nm+Cu100nm ±10% [P (100), 1-100 Ω] for Research Use, Double-sided Mirror DF Product, 25 Pieces 

特徴

  • We have a proven track record for research and development, and offer wafers made from high-purity materials from small quantities.

仕様

  • Size: 12 inch silicon wafer
  • Ti (Titanium) +Cu (Copper) [Sputtering] Film Thickness: 50 nm+100 nm±10% (Data Included)
  • Diameter (mm): 300.0±0.5
  • Wafer thickness (μm): 775±25
  • Manufacturing method: CZ method
  • Conductive Type: P Type
  • Face Bearing: 100
  • Resistance value (Ω · cm): 1~100
  • V Notch
  • Face States: Mirror/Mirror
  • particles: dust free
  • TTV(μm):≦20
  • Quantity: 25 sheets (1 box)
  • *custom-made product
  • We also have a variety of other products, such as laminated films and patterning, so please feel free to contact us.
  • Various shapes and surface treatments are possible (Examples: Etching, Counterboring, Drilling, Oxidized Wafers).
  • It is possible to match the specific resistivity and wafer thickness you desire.
  • *Although this product is manufactured and processed using crystal materials for semiconductors, it is not possible to verify the purity of the material.
  • *We do not ask any questions about the products with film unevenness or film thickness.
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荷姿サイズ410×460×420 mm 1 kg  [荷姿サイズについて]

アズワン品番 67-6461-53
標準価格 JPY: 1,024,800 USD: 6,376.31
Excange rate 1USD= 160.72JPY
Valid price in Japan
入り数 1box(25sheets)
在庫数
공급자 재고

제품 카탈로그

掲載カタログ名 페이지
AS ONE Catalog 2025 [Instruments for Laboratory] 1939